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Applied Physics Reviews — 1985


GaAs, AlAs, and AlxGa1−xAs@B: Material parameters for use in research and device applications

Sadao Adachi

J. Appl. Phys. 58, R1 (1985); http://dx.doi.org/10.1063/1.336070 (29 pages)

Online Publication Date: 12 December 2006

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The AlxGa1−xAs/GaAs heterostructure system is potentially useful material for high‐speed digital, high‐frequency microwave, and electro‐optic device applications. Even though the basic AlxGa1−xAs/GaAs heterostructure concepts are understood at this time, some practical device parameters in this system have been hampered by a lack of definite knowledge of many material parameters. Recently, Blakemore has presented numerical and graphical information about many of the physical and electronic properties of GaAs [J. S. Blakemore, J. Appl. Phys. 53, R123 (1982)]. The purpose of this review is (i) to obtain and clarify all the various material parameters of AlxGa1−xAs alloy from a systematic point of view, and (ii) to present key properties of the material parameters for a variety of research works and device applications. A complete set of material parameters are considered in this review for GaAs, AlAs, and AlxGa1−xAs alloys. The model used is based on an interpolation scheme and, therefore, necessitates known values of the parameters for the related binaries (GaAs and AlAs). The material parameters and properties considered in the present review can be classified into sixteen groups: (1) lattice constant and crystal density, (2) melting point, (3) thermal expansion coefficient, (4) lattice dynamic properties, (5) lattice thermal properties, (6) electronic‐band structure, (7) external perturbation effects on the band‐gap energy, (8) effective mass, (9) deformation potential, (10) static and high‐frequency dielectric constants, (11) magnetic susceptibility, (12) piezoelectric constant, (13) Fröhlich coupling parameter, (14) electron transport properties, (15) optical properties, and (16) photoelastic properties.
Of particular interest is the deviation of material parameters from linearity with respect to the AlAs mole fraction x. Some material parameters, such as lattice constant, crystal density, thermal expansion coefficient, dielectric constant, and elastic constant, obey Vegard’s rule well. Other parameters, e.g., electronic‐band energy, lattice vibration (phonon) energy, Debye temperature, and impurity ionization energy, exhibit quadratic dependence upon the AlAs mole fraction. However, some kinds of the material parameters, e.g., lattice thermal conductivity, exhibit very strong nonlinearity with respect to x, which arises from the effects of alloy disorder. It is found that the present model provides generally acceptable parameters in good agreement with the existing experimental data. A detailed discussion is also given of the acceptability of such interpolated parameters from an aspect of solid‐state physics. Key properties of the material parameters for use in research work and a variety of AlxGa1−xAs/GaAs device applications are also discussed in detail.
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71.20.-b Electron density of states and band structure of crystalline solids
78.20.Ci Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)
75.30.Cr Saturation moments and magnetic susceptibilities
65.90.+i Other topics in thermal properties of condensed matter (restricted to new topics in section 65)

Metalorganic chemical vapor deposition of III‐V semiconductors

M. J. Ludowise

J. Appl. Phys. 58, R31 (1985); http://dx.doi.org/10.1063/1.336296 (25 pages)

Online Publication Date: 12 December 2006

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The metalorganic chemical vapor deposition (MOCVD) of epitaxial III‐V semiconductor alloys on III‐V substrates is reviewed in detail. The emphasis is placed on both practical and theoretical knowledge of the equipment and deposition process. The chemistry of the source alkyls and the dynamics of the transport process are discussed. The growth of the GaAs and AlxGa1−xAs systems are treated as prototypical examples (and the most studied) of the III‐V materials. Latter sections review InP, Ga1−xInxAs, and related alloys. Finally, the antimonide and the other systems are reviewed. Electronic and optical devices fabricated from MOCVD‐grown materials are used as examples of the capabilities of the growth technique.
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81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
68.55.-a Thin film structure and morphology

Nonlinear integrated optics

George I. Stegeman and Colin T. Seaton

J. Appl. Phys. 58, R57 (1985); http://dx.doi.org/10.1063/1.336205 (22 pages)

Online Publication Date: 12 December 2006

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We review the work done to date in the field of nonlinear integrated optics. Emphasis is placed on (intrinsic) second‐ and third‐order phenomena occurring in planar geometry structures and several applications are discussed. All of the nonlinear interactions are discussed in a single notation.
Show PACS
42.82.-m Integrated optics
42.65.-k Nonlinear optics
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