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Applied Physics Reviews — 1995


Growth and optical properties of nanometer‐scale GaAs and InAs whiskers

K. Hiruma, M. Yazawa, T. Katsuyama, K. Ogawa, K. Haraguchi, M. Koguchi, and H. Kakibayashi

J. Appl. Phys. 77, 447 (1995); http://dx.doi.org/10.1063/1.359026 (16 pages)

Online Publication Date: 12 December 2006

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The growth process, crystal structure, and optical properties of ultrathin GaAs and InAs wires (whiskers) as thin as 15–40 nm and about 2 μm long are reviewed and discussed. Experimental results for growing whiskers using Au as a growth catalyst during metalorganic vapor phase epitaxy (MOVPE) and the shape and growth direction of whiskers provide new insight into growth control of GaAs and InAs whiskers. The crystal structure of whiskers, Au behavior during MOVPE, and their growth mechanism are reviewed and discussed on the basis of transmission electron microscopic analysis. The photoluminescence spectra of GaAs wires are compared with those of a GaAs epitaxial layer, and the effect of surface treatment on the luminescence peak energy shift is discussed. The time dependent photoluminescence of GaAs wires is also discussed. The application of GaAs whiskers to light emitting devices is reviewed because a semiconductor wire structure employing quantum size effects is a very important element of electronic and optical devices. © 1995 American Institute of Physics.
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68.70.+w Whiskers and dendrites (growth, structure, and nonelectronic properties)
81.15.Kk Vapor phase epitaxy; growth from vapor phase
85.60.Jb Light-emitting devices

Nonlocal and nonlinear transport in semiconductors: Real‐space transfer effects

Z. S. Gribnikov, Karl Hess, and G. A. Kosinovsky

J. Appl. Phys. 77, 1337 (1995); http://dx.doi.org/10.1063/1.358947 (37 pages)

Online Publication Date: 12 December 2006

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The contributions of nonlocal mechanisms to nonlinear transport in semiconductors, with special emphasis on hot‐electron emission at heterojunctions and its variations which are now commonly termed real‐space transfer effects, are reviewed. The goal is to equitably account for and bring together the body of literature that has developed, often independently, in the U.S. and the former Soviet Union as well as in Europe and Japan. © 1995 American Institute of Physics.
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72.20.Dp General theory, scattering mechanisms
72.20.Ht High-field and nonlinear effects

Heat and mass transfer in semiconductor melts during single‐crystal growth processes

Koichi Kakimoto

J. Appl. Phys. 77, 1827 (1995); http://dx.doi.org/10.1063/1.358882 (16 pages)

Online Publication Date: 12 December 2006

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The quality of large semiconductor crystals grown from melts is significantly affected by the heat and mass transfer in the melts. The current understanding of the phenomena, especially melt convection, is reviewed starting from the results of visualization using model fluids or silicon melt, and continuing to the detailed numerical calculations needed for quantitative modeling of processing with solidification. The characteristics of silicon flows are also reviewed by focusing on the Coriolis force in the rotating melt. Descriptions of flow instabilities are included that show the level of understanding of melt convection with a low Prandtl number. Based on hydrodynamics, the origin of the silicon flow structure is reviewed, and it is discussed whether silicon flow is completely turbulent or has an ordered structure. The phase transition from axisymmetric to nonaxisymmetric flow is discussed using different geometries. Additionally, surface‐tension‐driven flow is reviewed for Czochralski crystal growth systems. © 1995 American Institute of Physics.
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81.10.Fq Growth from melts; zone melting and refining

Isotopically engineered semiconductors

E. E. Haller

J. Appl. Phys. 77, 2857 (1995); http://dx.doi.org/10.1063/1.358700 (22 pages)

Online Publication Date: 12 December 2006

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Scientific interest, technological promise, and increased availability of highly enriched isotopes have led to a sharp rise in the number of experimental and theoretical studies with isotopically controlled semiconductor crystals. This review of mostly recent activities begins with an introduction to some past classical experiments which have been performed on isotopically controlled semiconductors.
A review of the natural isotopic composition of the relevant elements follows. Some materials aspects resulting in part from the high costs of enriched isotopes are discussed next. Raman spectroscopy studies with a number of isotopically pure and deliberately mixed Ge bulk crystals show that the Brillouin‐zone‐center optical phonons are not localized. Their lifetime is almost independent of isotopic disorder, leading to homogeneous Raman line broadening. Studies with short period isotope superlattices consisting of alternating layers of n atomic planes of 70Ge and 74Ge reveal a host of zone‐center phonons due to Brillouin‐zone folding. At n≳40 one observes two phonon lines at frequencies corresponding to the bulk values of the two isotopes. In natural diamond, isotope scattering of the low‐energy phonons, which are responsible for the thermal conductivity, is very strongly affected by small isotope disorder. Isotopically pure 12C diamond crystals exhibit thermal conductivities as high as 410 W cm−1 K−1 at 104 K, leading to projected values of over 2000 W cm−1 K−1 near 80 K.
The changes in phonon properties with isotopic composition also weakly affect the electronic band structures and the lattice constants. The latter isotope dependence is most relevant for future standards of length based on crystal lattice constants. Capture of thermal neutrons by isotope nuclei followed by nuclear decay produces new elements, resulting in a very large number of possibilities for isotope selective doping of semiconductors. This neutron transmutation of isotope nuclei, already used for homogeneous doping of floating zone Si with P, holds perhaps the biggest promises for isotopically controlled semiconductors and is discussed in some detail. Local vibrational modes of low‐mass impurities are sensitive to the mass of the impurity as well as the masses of the host atoms neighboring the impurity. High‐resolution infrared‐absorption studies of O in Ge crystals of different isotopic composition demonstrate the extreme simplification in such spectra which is achieved by isotope control. Interdiffusion of GaAs and Ge isotope superlattices with 0.1–1 μm thick layers have been studied with secondary‐ion‐mass spectroscopy. This kind of internal diffusion avoids the problems with surface effects and can produce accurate data without the need for radioactive tracers. The review closes with an outlook on the exciting future possibilities offered through isotope control of a wide range of semiconductor materials. © 1995 American Institute of Physics.
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72.80.-r Conductivity of specific materials
63.20.-e Phonons in crystal lattices
28.60.+s Isotope separation and enrichment

Semiconductor molecular‐beam epitaxy at low temperatures

D. J. Eaglesham

J. Appl. Phys. 77, 3597 (1995); http://dx.doi.org/10.1063/1.358597 (21 pages)

Online Publication Date: 12 December 2006

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Low‐temperature molecular‐beam epitaxy (MBE) in semiconductors is reviewed, with a focus on limited thickness epitaxy (LTE), the regime where crystalline growth over an epitaxial thickness hepi is followed by a transition to amorphous deposition. The goal is to summarize the main results on this phenomenon, make the connection to other results on low‐temperature MBE, and present the large body of unpublished data on hepi. Since the problem is still not fully understood, all available data that have a bearing on the understanding of the effect are outlined. The scientific questions and practical problems that have driven interest in low‐temperature growth are outlined, and the phenomenon of LTE and the dependence of hepi on the growth conditions are described. The LTE effect is apparently general, but Si(100) is the model system for which most data are available. Breakdown of epitaxy follows a universal curve that is inconsistent with continuous nucleation of the amorphous phase, implying that growth is truly thickness dependent. The epitaxial thickness is thermally activated in substrate temperature T as hepi=h0 exp(−Eact/kBT), with h0 following a weak ln(R) or R1/4 dependence on deposition rate R. hepi is also strongly influenced by lattice mismatch strain, residual H in the ultrahigh vacuum, and annealing during growth interrupts. Possible mechanisms for LTE are discussed, with particular emphasis on the roles played by H and kinetic roughening, and the key experiments distinguishing these mechanisms are described. Finally, an attempt is made to draw up the best current picture of the phenomenon. It is concluded that roughening provides the fundamental limit to epitaxy at low temperature, but with H contamination playing an important part in controlling surface diffusion: outstanding problems include the rate dependence and the details of the roughening behavior. © 1995 American Institute of Physics.
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81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy

Oxygen precipitation in silicon

A. Borghesi, B. Pivac, A. Sassella, and A. Stella

J. Appl. Phys. 77, 4169 (1995); http://dx.doi.org/10.1063/1.359479 (76 pages)

Online Publication Date: 12 December 2006

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A review is presented of the recent advances in the study of oxygen precipitation and of the main properties of oxide precipitates in silicon. After a general overview of the system ‘‘oxygen in silicon,’’ the thermodynamics and the kinetics of the precipitate formation are treated in detail, with major emphasis on the phenomenology; subsequently, the most important techniques for the characterization of the precipitates are illustrated together with the most interesting and recent results. Finally, the possible influence of oxygen precipitation on technological applications is stressed, with particular attention to recent results regarding device yield. Actually, the essential novelty of this review rests on the attempt to give an extended picture of what has been recently clarified by means of highly sophisticated diagnostic methods and of the influence of precipitation on the properties of semiconductor devices. © 1995 American Institute of Physics.
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61.72.Qq Microscopic defects (voids, inclusions, etc.)
81.30.Mh Solid-phase precipitation

Recent progress in computer‐aided materials design for compound semiconductors

Tomonori Ito

J. Appl. Phys. 77, 4845 (1995); http://dx.doi.org/10.1063/1.359360 (42 pages)

Online Publication Date: 12 December 2006

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Recent progress in computational materials science in the area of semiconductor materials is reviewed. Reliable predictions can now be made for a wide range of problems, such as band structure and structural and thermodynamic properties of various compound semiconductors, using electronic theories such as the pseudopotential method. Further applications are examined by investigating the behavior of various atomic species in semiconductors, including the stability and band structure of heterostructures, superlattices, lattice defects, alloy systems, and surface‐related properties such as surface reconstruction, surface passivation, and adatom migration during thin film growth. The empirical interatomic potentials, pseudopotential, and stochastic Monte Carlo methods are used. An overview of these issues is provided and the latest achievements are presented to illustrate the capability of the theoretical‐computational approach by comparing experimental results. The constituents of the semiconductors that are most applicable to electronic and optical devices, mainly group‐II, ‐III, ‐IV, ‐V, and ‐VI elements, are focused on. These successful applications of the theoretical‐computational approach lead to future prospects for the computer‐aided materials design for semiconductors introduced as ‘‘bond engineering.’’ © 1995 American Institute of Physics.
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71.10.-w Theories and models of many-electron systems
73.20.-r Electron states at surfaces and interfaces
68.65.-k Low-dimensional, mesoscopic, nanoscale and other related systems: structure and nonelectronic properties
68.35.-p Solid surfaces and solid-solid interfaces: structure and energetics

Resonant cavity enhanced photonic devices

M. Selim Ünlü and Samuel Strite

J. Appl. Phys. 78, 607 (1995); http://dx.doi.org/10.1063/1.360322 (33 pages)

Online Publication Date: 12 December 2006

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We review the family of optoelectronic devices whose performance is enhanced by placing the active device structure inside a Fabry‐Perot resonant microcavity. Such resonant cavity enhanced (RCE) devices benefit from the wavelength selectivity and the large increase of the resonant optical field introduced by the cavity. The increased optical field allows RCE photodetector structures to be thinner and therefore faster, while simultaneously increasing the quantum efficiency at the resonant wavelengths. Off‐resonance wavelengths are rejected by the cavity making RCE photodetectors promising for low crosstalk wavelength division multiplexing (WDM) applications. RCE optical modulators require fewer quantum wells so are capable of reduced voltage operation. The spontaneous emission spectrum of RCE light emitting diodes (LED) is drastically altered, improving the spectral purity and directivity. RCE devices are also highly suitable for integrated detectors and emitters with applications as in optical logic and in communication networks. This review attempts an encyclopedic overview of RCE photonic devices and systems. Considerable attention is devoted to the theoretical formulation and calculation of important RCE device parameters. Materials criteria are outlined and the suitability of common heteroepitaxial systems for RCE devices is examined. Arguments for the improved bandwidth in RCE detectors are presented intuitively, and results from advanced numerical simulations confirming the simple model are provided. An overview of experimental results on discrete RCE photodiodes, phototransistors, modulators, and LEDs is given. Work aimed at integrated RCE devices, optical logic and WDM systems is also covered. We conclude by speculating what remains to be accomplished to implement a practical RCE WDM system. © 1995 American Institute of Physics.
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85.60.-q Optoelectronic devices
42.79.Pw Imaging detectors and sensors

Franz–Keldysh oscillations in modulation spectroscopy

H. Shen and M. Dutta

J. Appl. Phys. 78, 2151 (1995); http://dx.doi.org/10.1063/1.360131 (26 pages)

Online Publication Date: 12 December 2006

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In the presence of an electric field, the dielectric constant of a semiconductor exhibits Franz–Keldysh oscillations (FKO), which can be detected by modulated reflectance. Although it could be a powerful and simple method to study the electric fields/charge distributions in various semiconductor structures, in the past it has proven to be more complex. This is due to nonuniform fields and impurity induced broadening, which reduce the number of detectible Franz–Keldysh oscillations, and introduce uncertainties into the measurement. In 1989, a new structure, surface–undoped–doped (sin+/sip+) was developed, which allows the observation of a large number of FKOs and, hence, permitting accurate determination of electric fields. We present a review of the work on measuring electric fields in semiconductors with a particular emphasis on microstructures using the specialized layer sequence. We first discuss the general theory of modulation techniques dwelling on the approximations and their relevance. The case of uniform field, obtained with this specialized structure as well as that of the nonuniform field, are addressed. The various experimental techniques are also briefly reviewed. We then summarize the various experimental results obtained in the last few years using these special structures and FKOs and find that, even in this short period, good use has been made of the technique and the structure. This is followed by a brief review of the work on nonuniform fields. In this case, the work on actual device structures has significant technological implications. Important issues such as metallization and processing, the effects of surface treatment and thermal annealing, Schottky barrier heights of different metals, piezoelectric fields in (111) grown strained InGaAs/GaAs quantum wells, and Fermi level in low‐temperature grown GaAs have been studied using this structure. This structure has also been used to study the dynamics of photomodulation, revealing the nature of the cw photoreflectance. © 1995 American Institute of Physics.
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78.20.Jq Electro-optical effects
78.66.-w Optical properties of specific thin films
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